Lithography of Curvature

Posted in Journal Articles on April 30, 2012 at 5:37 pm by JCCMP

Designing Responsive Buckled Surfaces by Halftone Gel Lithography,
Authors: Jungwook Kim, James A. Hanna, Myunghwan Byun, Christian D. Santangelo, Ryan C. Hayward.
Science, 335, 1201 (2012).

Recommended and a Commentary by Eran Sharon, Hebrew University of Jerusalem |View Commentary (pdf)|

Guidelines for Comments by Members:
Members are invited to comment on the chosen papers and refer only to papers intimately related to the papers selected. Other comments and suggestions can be transmitted to the organizers through the 'Guest book' link. These comments will be put on the web-site and the archives so that they can be read by other members. Just as in the Guidelines to the Corresponding Members, we suggest that the comments be confined to substantive issues of science and in order to illuminate the subject matter. A collegial and respectful tone is suggested. Issues of priority should not be raised in the comments.

Leave Your Comment Below

Your email address will not be published. Required fields are marked *

google

google